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AuthorHinz, Michaeldc.contributor.author
AuthorMarti, Othmardc.contributor.author
AuthorGotsmann, Bernddc.contributor.author
AuthorLantz, Mark A.dc.contributor.author
AuthorDürig, Ursdc.contributor.author
Date of accession2023-01-24T13:46:30Zdc.date.accessioned
Available in OPARU since2023-01-24T13:46:30Zdc.date.available
Date of first publication2008dc.date.issued
Languageendc.language.iso
PublisherUniversität Ulmdc.publisher
KeywordCONDUCTIVITYdc.subject
Dewey Decimal GroupDDC 530 / Physicsdc.subject.ddc
TitleHigh resolution vacuum scanning thermal microscopy of HfO2 and SiO2dc.title
Resource typeWissenschaftlicher Artikeldc.type
FacultyFakultät für Naturwissenschaftenuulm.affiliationGeneral
InstitutionInstitut für Experimentelle Physikuulm.affiliationSpecific
DCMI TypeTextuulm.typeDCMI
CategoryPublikationsnachweiseuulm.category
DOI (external)10.1063/1.2840186dc.identifier.doiExternal
Source - Title of sourceApplied Physics Letterssource.title
Source - Place of publicationAmerican Institute of Physicssource.publisher
Source - Volume92source.volume
Source - Issue4source.issue
Source - Year2008source.year
Source - Article number043122source.articleNumber
Source - ISSN0003-6951source.identifier.issn
Source - eISSN1077-3118source.identifier.eissn
CommunityUniversität Ulmuulm.community
WoS000252860400097uulm.identifier.wos
Bibliographyuulmuulm.bibliographie


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