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AuthorMüller, Raphaeldc.contributor.author
AuthorHuber, Floriandc.contributor.author
AuthorTöws, Matthiasdc.contributor.author
AuthorMangold, Martindc.contributor.author
AuthorMadel, Manfreddc.contributor.author
AuthorScholz, Jan-Patrickdc.contributor.author
AuthorMinkow, Alexanderdc.contributor.author
AuthorHerr, Ulrichdc.contributor.author
AuthorThonke, Klausdc.contributor.author
Date of accession2021-01-26T10:05:42Zdc.date.accessioned
Available in OPARU since2021-01-26T10:05:42Zdc.date.available
Date of first publication2020dc.date.issued
Languageendc.language.iso
PublisherUniversität Ulmdc.publisher
KeywordCHEMICAL-VAPOR-DEPOSITIONdc.subject
KeywordMOLECULAR-BEAM EPITAXYdc.subject
KeywordZINC-OXIDEdc.subject
KeywordTHIN-FILMSdc.subject
KeywordGANdc.subject
KeywordOPTIMIZATIONdc.subject
KeywordDEVICESdc.subject
KeywordMETHANEdc.subject
KeywordTCOdc.subject
Dewey Decimal GroupDDC 500 / Natural sciences & mathematicsdc.subject.ddc
Dewey Decimal GroupDDC 540 / Chemistry & allied sciencesdc.subject.ddc
Dewey Decimal GroupDDC 620 / Engineering & allied operationsdc.subject.ddc
TitleHigh-Quality ZnO Layers Grown by CVD on Sapphire Substrates with an AlN Nucleation Layerdc.title
Resource typeWissenschaftlicher Artikeldc.type
FacultyFakultät für Naturwissenschaftenuulm.affiliationGeneral
InstitutionInstitut für Quantenmaterieuulm.affiliationSpecific
InstitutionInstitut für Funktionelle Nanosystemeuulm.affiliationSpecific
DCMI TypeTextuulm.typeDCMI
CategoryPublikationsnachweiseuulm.category
DOI (external)10.1021/acs.cgd.0c00242dc.identifier.doiExternal
Source - Title of sourceCrystal Growth and Designsource.title
Source - Place of publicationAmerican Chemical Societysource.publisher
Source - Volume20source.volume
Source - Issue6source.issue
Source - Year2020source.year
Source - From page3918source.fromPage
Source - To page3926source.toPage
Source - ISSN1528-7483source.identifier.issn
Source - eISSN1528-7505source.identifier.eissn
Suitable communityFakultät für Naturwissenschaftenuulm.community
Suitable communityFakultät für Ingenieurwissenschaften, Informatik und Psychologieuulm.community
WoS000538515500040uulm.identifier.wos
University Bibliographyjauulm.unibibliographie


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