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AuthorBalogh, Zoltandc.contributor.author
AuthorErdelyi, Zoltandc.contributor.author
AuthorBeke, Dezso L.dc.contributor.author
AuthorWiedwald, Ulfdc.contributor.author
AuthorPfeiffer, Holgerdc.contributor.author
AuthorTschetschetkin, Annadc.contributor.author
AuthorZiemann, Pauldc.contributor.author
Date of accession2020-05-26T11:47:56Zdc.date.accessioned
Available in OPARU since2020-05-26T11:47:56Zdc.date.available
Date of first publication2010dc.date.issued
Languageendc.language.iso
PublisherUniversität Ulmdc.publisher
KeywordPhotoelectron spectroscopydc.subject
KeywordAnomalous diffusiondc.subject
KeywordSemiconductordc.subject
KeywordALLOYSdc.subject
KeywordINTERDIFFUSIONdc.subject
KeywordSEGREGATIONdc.subject
Dewey Decimal GroupDDC 530 / Physicsdc.subject.ddc
Dewey Decimal GroupDDC 620 / Engineering & allied operationsdc.subject.ddc
TitleDissolution kinetics of Si into Ge (111) substrate on the nanoscaledc.title
Resource typeWissenschaftlicher Artikeldc.type
FacultyFakultät für Naturwissenschaftenuulm.affiliationGeneral
InstitutionInstitut für Festkörperphysikuulm.affiliationSpecific
DCMI TypeTextuulm.typeDCMI
CategoryPublikationsnachweiseuulm.category
DOI (external)10.1016/j.tsf.2010.08.146dc.identifier.doiExternal
Source - Title of sourceThin Solid Filmssource.title
Source - Place of publicationElseviersource.publisher
Source - Volume519source.volume
Source - Issue2source.issue
Source - Year2010source.year
Source - From page952source.fromPage
Source - To page955source.toPage
Source - ISSN0040-6090source.identifier.issn
CommunityFakultät für Naturwissenschaftenuulm.community
WoS000284499500073uulm.identifier.wos
Bibliographyuulmuulm.bibliographie


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