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AuthorNilsen, Madeleinedc.contributor.author
AuthorPort, Fabiandc.contributor.author
AuthorRoos, Michaeldc.contributor.author
AuthorGottschalk, Kay-Eberharddc.contributor.author
AuthorStrehle, Steffendc.contributor.author
Date of accession2019-09-20T07:52:53Zdc.date.accessioned
Available in OPARU since2019-09-20T07:52:53Zdc.date.available
Date of first publication2019dc.date.issued
Languageendc.language.iso
PublisherUniversität Ulmdc.publisher
Dewey Decimal GroupDDC 530 / Physicsdc.subject.ddc
Dewey Decimal GroupDDC 620 / Engineering & allied operationsdc.subject.ddc
TitleFacile modification of freestanding silicon nitride microcantilever beams by dry film photoresist lithographydc.title
Resource typeWissenschaftlicher Artikeldc.type
FacultyFakultät für Ingenieurwissenschaften, Informatik und Psychologieuulm.affiliationGeneral
FacultyFakultät für Naturwissenschaftenuulm.affiliationGeneral
InstitutionInstitut für Elektronische Bauelemente und Schaltungenuulm.affiliationSpecific
InstitutionInstitut für Experimentelle Physikuulm.affiliationSpecific
DCMI TypeTextuulm.typeDCMI
CategoryPublikationsnachweiseuulm.category
DOI (external)10.1088/1361-6439/aaf7e3dc.identifier.doiExternal
Source - Title of sourceJournal of Micromechanics and Microengineeringsource.title
Source - Place of publicationIOP Publishingsource.publisher
Source - Volume29source.volume
Source - Issue2source.issue
Source - Year2019source.year
Source - Article number025014source.articleNumber
Source - ISSN0960-1317source.identifier.issn
Source - eISSN1361-6439source.identifier.eissn
FundingMinistry of Education and Research Germany [BMBF: NanoMatFutur: 13N12545]uulm.funding
FundingGerman Research Foundation (DFG: Research Training Group GRK 2203)uulm.funding
Suitable communityFakultät für Ingenieurwissenschaften, Informatik und Psychologieuulm.community
Suitable communityFakultät für Naturwissenschaftenuulm.community
WoS000455934500002uulm.identifier.wos


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