Nanostructured Fe2O3 Processing via Water-Assisted ALD and Low-Temperature CVD from a Versatile Iron Ketoiminate Precursor

Erstveröffentlichung

2017

Authors

Peeters, Daniel

Sadlo, Alexander

Lowjaga, Katarina

Reyes, Oliver Mendoza

Wang, Lidong

et al.

Wissenschaftlicher Artikel

Published in

Advanced Materials Interfaces ; 4 (2017), 18, SI. - Art.-Nr. 1700155. - ISSN 2196-7350

Link to publication

https://dx.doi.org/10.1002/admi.201700155

Faculties

Fakultät für Naturwissenschaften

Institutions

Institut für Elektrochemie

Subject headings

[Free subject headings]: atomic layer deposition | chemical vapor deposition | iron oxide | precursors | photoelectrochemical water splitting | chemical-vapor-deposition | alpha-fe2o3 thin-films | oxygen-evolution | iron(iii) oxide | photoelectrochemical properties | structural-characterization | raman microspectroscopy | beta-ketoiminate | hematite
[DDC subject group]: DDC 540 / Chemistry & allied sciences

Metadata

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